Acknowledgement

A Project on Light Emitting Diodes By Vivek Tejwani, V.Priyan, Prakash Toshniwal, Jaswant Singh, Gaurav Kumar Agrawal, Vnvm Abhinav and Kishore R, Students of IIT Indore's 2011-'15 Batch Computer Science And Engineering, guided by Mr. Manavendra Mahato (Ph.D. in University of Michigan, 2007 and B.Tech in Engineering Physics, IIT Bombay, 2001)

Wednesday 2 November, 2011

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Light Emitting Diode is essentially a Diode, which itself is a semiconductor. Let’s try to understand the basics of a semiconductor.









Can you guess which electronic devices is common to the above components?


Well they are SEMICONDUCTORS


Semiconductors have had a monumental impact on our society. You find semiconductors at the heart of microprocessor chips as well as transistors. Anything that's computerized or uses radio waves depends on semiconductors.
A semiconductor is a material with electrical conductivity due to electron flow (as opposed to ionic conductivity) intermediate in magnitude between that of a conductor and an insulator. It includes transistors, solar cells, many kinds of diodes including the light- emitting diode, the silicon controlled rectifier, and digital and analog integrated circuits.




Semiconductors and insulators are distinguished from metals because the valence band in any given metal is nearly filled with electrons under usual operating conditions, while very few (semiconductor) or virtually none (insulator) of them are available in the conduction band, the band immediately above the valence band.



Today, most semiconductor chips and transistors are created with silicon. You may have heard expressions like "Silicon Valley" and the "silicon economy," and that's why -- silicon is the heart of any electronic device.

Silicon is a very common element -- for example, it is the main element in sand and quartz. If you look "silicon" up in the periodic table, you will find that it sits next to aluminum, below carbon and above germanium.


Position of Silicon

Silicon sits next to aluminum and below carbon in the periodic table.
Carbon, silicon and germanium (germanium, like silicon, is also a semiconductor) have a unique property in their electron structure -- each has four electrons in its outer orbital. This allows them to form nice crystals. The four electrons form perfect covalent bonds with four neighboring atoms, creating a lattice. In carbon, we know the crystalline form as diamond. In silicon, the crystalline form is a silvery, metallic-looking substance.

In a silicon lattice, all silicon atoms bond perfectly to four neighbors, leaving no free electrons to conduct electric current. This makes a silicon crystal an insulator rather than a conductor.
Metals tend to be good conductors of electricity because they usually have "free electrons" that can move easily between atoms, and electricity involves the flow of electrons. While silicon crystals look metallic, they are not, in fact, metals. All of the outer electrons in a silicon crystal are involved in perfect covalent bonds, so they can't move around. A pure silicon crystal is nearly an insulator -- very little electricity will flow through it.



But you can change all this through a process called doping.


Doping Silicon


The ease with which electrons in the semiconductor can be excited from the valence band to the conduction band depends on the band gap between the bands. The size of this energy bandgap serves as an arbitrary dividing line (roughly 4 eV) between semiconductors and insulators.

A pure semiconductor is often called an “intrinsic” semiconductor. The electronic properties and the conductivity of a semiconductor can be changed in a controlled manner by adding very small quantities of other elements, called “dopants”, to the intrinsic material. In crystalline silicon typically this is achieved by adding impurities of boron or phosphorus to the melt and then allowing the melt to solidify into the crystal. This process is called "doping".
Intrinsic Semiconductor: No impurities are added.

No. of electrons = No. of holes

You can change the behavior of silicon and turn it into a conductor by doping it. In doping, you mix a small amount of an impurity into the silicon crystal.
There are two types of impurities:
N-type - In N-type doping, phosphorus or arsenic is added to the silicon in small quantities. Phosphorus and arsenic each have five outer electrons, so they're out of place when they get into the silicon lattice. The fifth electron has nothing to bond to, so it's free to move around. It takes only a very small quantity of the impurity to create enough free electrons to allow an electric current to flow through the silicon. N-type silicon is a good conductor. Electrons have a negative charge, hence the name N-type.
P-type - In P-type doping, boron or gallium is the dopant. Boron and gallium each have only three outer electrons. When mixed into the silicon lattice, they form "holes" in the lattice where a silicon electron has nothing to bond to. The absence of an electron creates the effect of a positive charge, hence the name P-type. Holes can conduct current. A hole happily accepts an electron from a neighbor, moving the hole over a space. P-type silicon is a good conductor.
A minute amount of either N-type or P-type doping turns a silicon crystal from a good insulator into a viable (but not great) conductor -- hence the name "semiconductor."
N-type and P-type silicon are not that amazing by themselves; but when you put them together, you get some very interesting behavior at the junction. That's what happens in a diode.

Electrons excited to the conduction band also leave behind electron holes, i.e. unoccupied states in the valence band. Both the conduction band electrons and the valence band holes contribute to electrical conductivity. The holes themselves don't actually move, but a neighboring electron can move to fill the hole, leaving a hole at the place it has just come from, and in this way the holes appear to move, and the holes behave as if they were actual positively charged particles.

A donor atom that activates (that is, becomes incorporated into the crystal lattice) donates weakly bound valence electrons to the material, creating excess negative charge carriers. These weakly bound electrons can move about in the crystal lattice relatively freely and can facilitate conduction in the presence of an electric field. Its known as n-type impurity.
N type
Conversely, an activated acceptor produces a hole. It is known as a p-type impurity.


P Type

The n and p type designations indicate which charge carrier acts as the material's majority carrier. The opposite carrier is called the minority carrier, which exists due to thermal excitation at a much lower concentration compared to the majority carrier.





EFFECT OF DOPING:
A 1 cm3 specimen of a metal or semiconductor has of the order of 1022 atoms. In a metal every atom donates at least one free electron for conduction, thus 1 cm3 of metal contains on the order of 1022 free electrons. Whereas a 1 cm3 of sample pure germanium at 20 °C, contains about 4.2×1022 atoms and 2.5×1013 free electrons and 2.5×1013 holes (empty spaces in crystal lattice having positive charge). The addition of 0.001% of arsenic (an impurity) donates an extra 1017 free electrons in the same volume and the electrical conductivity is increased by a factor of 10,000.





  • Carrier concentration
The concentration of dopant introduced to an intrinsic semiconductor determines its concentration and indirectly affects many of its electrical properties. The most important factor that doping directly affects is the material's carrier concentration.


In general, an increase in doping concentration affords an increase in conductivity due to the higher concentration of carriers available for conduction. Degenerately (very highly) doped semiconductors have conductivity levels comparable to metals and are often used in modern integrated circuits as a replacement for metal. Often superscript plus and minus symbols are used to denote relative doping concentration in semiconductors. For example, n+ denotes an n-type semiconductor with a high, often degenerate, doping concentration. Similarly, p- would indicate a very lightly doped p-type material. It is useful to note that even degenerate levels of doping imply low concentrations of impurities with respect to the base semiconductor. In crystalline intrinsic silicon, there are approximately 5×1022 atoms/cm³. Doping concentration for silicon semiconductors may range anywhere from 1013 cm−3 to 1018 cm−3. Doping concentration above about 1018 cm−3 is considered degenerate at room temperature.



  • Introducing new energy levels:



Doping a semiconductor crystal introduces allowed energy states within the band gap but very close to the energy band that corresponds to the dopant type. In other words, donor impurities create states near the conduction band while acceptors create states near the valence band. The gap between these energy states and the nearest energy band is usually referred to as dopant-site bonding energy or EB and is relatively small. For example, the EB for boron in silicon bulk is 0.045 eV, compared with silicon's band gap of about 1.12 eV. Because EB is so small, it takes little energy to ionize the dopant atoms and create free carriers in the conduction or valence bands. Usually the thermal energy available at room temperature is sufficient to ionize most of the dopant.
Dopants also have the important effect of shifting the material's Fermi level towards the energy band that corresponds with the dopant with the greatest concentration. Since the Fermi level must remain constant in a system in thermodynamic equilibrium, stacking layers of materials with different properties leads to many useful electrical properties. For example, the p-n junction's properties are due to the energy band bending that happens as a result of lining up the Fermi levels in contacting regions of p-type and n-type material.
This effect is shown in a band diagram. The band diagram typically indicates the variation in the valence band and conduction band edges versus some spatial dimension, often denoted x.

diode intro


What is a Diode?



A diode is the simplest sort of semiconductor device. Broadly speaking, a semiconductor is a material with a varying ability to conduct electrical current. Most semiconductors are made of a poor conductor that has had impurities added to it. The process of adding impurities is called doping.

In the case of LEDs, the conductor material is typically aluminum-gallium-arsenide (AlGaAs). In pure aluminum-gallium-arsenide, all of the atoms bond perfectly to their neighbors, leaving no free electrons (negatively charged particles) to conduct electric current. In doped material, additional atoms change the balance, either adding free electrons or creating holes where electrons can go. Either of these alterations make the material more conductive.

A diode consists of a section of N-type material bonded to a section of P-type material, with electrodes on each end. This arrangement conducts electricity in only one direction. When no voltage is applied to the diode, electrons from the N-type material fill holes from the P-type material along the junction between the layers, forming a depletion zone. In a depletion zone, the semiconductor material is returned to its original insulating state -- all of the holes are filled, so there are no free electrons or empty spaces for electrons, and charge can't flow.

To get rid of the depletion zone, you have to get electrons moving from the N-type area to the P-type area and holes moving in the reverse direction. A modern semiconductor diode is made of a crystal of semiconductor like silicon that has impurities added to it to create a region on one side that contains negative charge carriers (electrons), called n-type semiconductor, and a region on the other side that contains positive charge carriers (holes), called p-type semiconductor.

zero bias


Equilibrium (zero bias)
In a p–n junction, without an external applied voltage, an equilibrium condition is reached in which a potential difference is formed across the junction. This potential difference is called built-in potential Vbi.
After joining p-type and n-type semiconductors, electrons near the p–n interface tend to diffuse into the p region. As electrons diffuse, they leave positively charged ions (donors) in the n region. Similarly, holes near the p–n interface begin to diffuse into the n-type region leaving fixed ions (acceptors) with negative charge. The regions nearby the p–n interfaces lose their neutrality and become charged, forming the space charge region or depletion layer 
The electric field created by the space charge region opposes the diffusion process for both electrons and holes. There are two concurrent phenomena: the diffusion process that tends to generate more space charge, and the electric field generated by the space charge that tends to counteract the diffusion. The carrier concentration profile at equilibrium is shown in figure A with blue and red lines. Also shown are the two counterbalancing phenomena that establish equilibrium.



The space charge region is a zone with a net charge provided by the fixed ions (donors or acceptors) that have been left uncovered by majority carrier diffusion. When equilibrium is reached, the charge density is approximated by the displayed step function. In fact, the region is completely depleted of majority carriers (leaving a charge density equal to the net doping level), and the edge between the space charge region and the neutral region is quite sharp (see figure B, Q(x) graph). The space charge region has the same magnitude of charge on both sides of the p–n interfaces, thus it extends farther on the less doped side (the n side in figures A and B).

forward bias


FORWARD BIASING:
In forward bias, the p-type is connected with the positive terminal and the n-type is connected with the negative terminal.
With a battery connected this way, the holes in the P-type region and the electrons in the N-type region are pushed towards the junction. This reduces the width of the depletion zone. The positive charge applied to the P-type material repels the holes, while the negative charge applied to the N-type material repels the electrons. As electrons and holes are pushed towards the junction, the distance between them decreases. This lowers the barrier in potential. With increasing forward-bias voltage, the depletion zone eventually becomes thin enough that the zone's electric field can't counteract charge carrier motion across the p–n junction, consequently reducing electrical resistance. The electrons which cross the p–n junction into the P-type material (or holes which cross into the N-type material) will diffuse in the near-neutral region. Therefore, the amount of minority diffusion in the near-neutral zones determines the amount of current that may flow through the diode.


Only majority carriers (electrons in N-type material or holes in P-type) can flow through a semiconductor for a macroscopic length. With this in mind, consider the flow of electrons across the junction. The forward bias causes a force on the electrons pushing them from the N side toward the P side. With forward bias, the depletion region is narrow enough that electrons can cross the junction and inject into the P-type material. However, they do not continue to flow through the P-type material indefinitely, because it is energetically favorable for them to recombine with holes. The average length an electron travels through the P-type material before recombining is called the diffusion length, and it is typically on the order of microns.


Although the electrons penetrate only a short distance into the P-type material, the electric current continues uninterrupted, because holes (the majority carriers) begin to flow in the opposite direction. The total current (the sum of the electron and hole currents) is constant in space, because any variation would cause charge buildup over time (this is Kirchhoff's current law). The flow of holes from the P-type region into the N-type region is exactly analogous to the flow of electrons from N to P (electrons and holes swap roles and the signs of all currents and voltages are reversed).


Therefore, the macroscopic picture of the current flow through the diode involves electrons flowing through the N-type region toward the junction, holes flowing through the P-type region in the opposite direction toward the junction, and the two species of carriers constantly recombining in the vicinity of the junction. The electrons and holes travel in opposite directions, but they also have opposite charges, so the overall current is in the same direction on both sides of the diode, as required.